Silicon Chip Plasma Etching Machine Function: 1. Suitable for 125*125, 156*156 polycrystalline-silicon-solar-cells etching. 2. 5-channel design to meet the high capacity. 3. High-precision drive roller designed to ensure process consistency and low running chip fragmentation rate. 4. Compact machine structure, simple and easy to maintain. 4. Special inlet designed to ensure the uniformity of the main tank of liquid. 5. Whole equipment equipped with efficient ventilation system to prevent leakage of acid gas, while ensuring the film after etching the surface without any Add to Basket
