This series equipment mainly integrates techniques of DC magnetron sputtering, intermediate-frequency sputtering and arc ion evaporation as a whole. With the combination of linear ionization source and pulse bias coating, this seriesequipment can makevarious properties of thin film of deposited particles improved. In addition, alloy film, compoundfilm and multilayer complex film can be plated on metal products and nonmetal products. With devoted R&D for several years undertaken by technicians andunique cathodic arc ion plating and unbalance magnetron system, the company has developed a whole set of PROPOWER series of computer automatic control system, making the plating film adhesive and dense, the consistency of repeated plating better. Thus, such system solves the problems of complicated manual operation and inconsistent film colors. Widely used in wat-ches, following, hardware, sanitary ware, tableware, and requirements of the cutting tool, hard wear-resisting up mould etc. TiN plating system, TiCN, CrN, TiNbN TiALN, TiCrN, TiNC, and all kinds of flint membrane (DL-C). 1. Magnetron sputtering principle is based on the theory of cathodic glow discharge, cathodic surface magnetic acoustic expa-nded to close to surface of workpiece, improve the sputtering from the rate atoms. Magnetron sputtering keeps the exquisite and enhanced the surface gloss. 2. Arc plasma evaporation source reliable performance, cathode and magnetic field structure in optimization in 30A electricity when coating, coating layer and shed basement interface, and has produced atomic diffusion characteristics of ion beam aux-iliary deposition. Our company can according to customer request edsign various specifications and types of vacuum coating machine, vacuum units and the electric control system also can be based on users requirements for design configuration.
