Fast Tableware Magnetron Sputtering Coating Machine (JTZ-)

 
 
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发货 China(Mainland)付款后3天内
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更新 2014-03-03 11:13
 
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DONGGUAN HUICHENG VACUUM TECHNOLOGY CO., LTD.

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Fast tableware Magnetron Sputtering Coating Machine (JTZ-) uses the magnetron sputtering cathode glow discharge technique to ionize and deposit the molecule(target) on the base material(PVD), as well as the resistance heating technique in the vacuum to melt the metal wire and or vaporize the metal molecule. Thus it can metallize the plastic surface of the base material, mobile phone shell, etc. Use the special filming to achieve the function of nonconductive products and electromagnetism shield, thereby to reach the standard of high-end electronic products manufacturing industry. Characteristic: The equipment integrates the plasma treatment, high-end cathode magnetron sputtering, resistance evaporation coating equipment, large load rotation frame and the automatic control technique. It has the reliable work, good repeatability and consistency., fast deposition rate, high adhesion, fine film, etc. The coating film is dense and hardness with low friction coefficient, to keep the smoothness of original workpiece surface, good flexibility, hard to break and fall. The equipment makes full automation of the coating technology come true. It uses the vacuum coating technique to coat on the surface of the base material. It has the features of low cost, high qualification rate, green environmental protection, etc. Applied industry: Plastic, ceramic, computer, mobile phone, high-end industry, home appliance, aviation, etc. It can coat the composite metal film, alloy film, transparent (translucent) film, nonconductive film, electromagnetism shield film, special film, etc.Mode Dimension JTL-1000 JTL-1200 JTL-1400 JTL-1400 1200*1400mm 1200*1500mm 1400*1800mm 1400*1800mm Application plastic decorative coating and glass decorative coating Film type Meal film, translucent film, nonconductive film, electromagnetism shield film, dielectric film, etc. Power source Resistance evaporation power, DC magnetron power, RF power Sputtering and electrode structure Column magnetron targets, plane rectangle targets, twin targets, evaporation electrode. Vacuum chamber structure Vertical double door, Vertical single door, pump system postposition, horizontal single door, pump system for side. Ultimate vacuum 8.0*10 -4 pa Vacuum system Diffusion pump +Roots pump +Mechanical pump +Holding pump Pump time Pump from atmosphere to 8.5*10 -3 , 15 minutes Workpiece motion mode Public rotation/ Frequency control Control mode Manual/Automatic all in one mode, Touch screen + PLC Remark We can design the dimension of the equipment according to customer’s special technique requirement.

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